Abstract:High-index-contrast optical devices form the backbone of densely integrated photonic circuits. While these devices are traditionally fabricated using lithography and etching, their performance is often limited by defects and sidewall roughness arising from fabrication imperfections. This paper reports a versatile, roll-to-roll and backend compatible technique for the fabrication of high-performance, high-index-contrast photonic structures in composition-engineered chalcogenide glass (ChG) thin films. Thin film ChG have emerged as important materials for photonic applications due to their high refractive index, excellent transparency in the infrared and large Kerr non-linearity. Both thermally evaporated and solution processed As-Se thin films are successfully employed to imprint waveguides and micro-ring resonators with high replicability and low surface roughness (0.9 nm). The micro-ring resonators exhibit an ultra-high quality-factor of 4 x 10(5) near 1550 nm wavelength, which represents the highest value reported in ChG micro-ring resonators. Furthermore, sub-micron nanoimprint of ChG films on non-planar plastic substrates is demonstrated, which establishes the method as a facile route for monolithic fabrication of high-index-contrast devices on a wide array of unconventional substrates.

Nanoimprint lithography for optic fluidics with phase gratings for environmental monitoring application

Optical Micro/nanofibre Embedded Soft Film Enables Multifunctional Flow Sensing in Microfluidic Chips

Simple and Cost-Effective Fabrication of Two-Dimensional Plastic Nanochannels from Silica Nanowire Templates

Fabrication of micro/nano fluidic channels by nanoimprint lithography and bonding using SU-8

A nanoimprint lithography for fabricating SU-8 gratings for near-infrared to deep-UV application

A New Route for Fabricating Polymer Optical Microcavities.

Optical Nanostructures Fabricated by Su-8 Based Nanoimprint Lithography

Development of Novel SU-8 Based Nanoimprint Lithography

Solvent-Free Nanofabrication Based on Ice-Assisted Electron-Beam Lithography.

Fabrication of Micro/Nanofluidic Chip on Glass Substrate and Its Application for Electrokinetic Concentration of Proteins

Fabrication of Optofluidic Systems Using Isotropic Wet Etched Masters in < 111 > Silicon Wafer

Fabrication of full glass chips with hybrid micro- and nanochannels and their application to protein concentration

Large Area Direct Nanoimprinting of SiO2–TiO2 Gel Gratings for Optical Applications

Fabrication of 1-d nanochannels on PMMA substrate by photoresist-free uv lithography and UV-assisted bonding under low temperature

Fabrication of 150 Nm Half-Pitch Grating Templates for Nanoimprint Lithography

Demonstration of High-Performance, Sub-Micron Chalcogenide Glass Photonic Devices by Thermal Nanoimprint

Double transfer UV-curing nanoimprint lithography.

Integrated fabrication of micro/nano-fluidic chip based on nano-imprint lithography and bonding

Glass etching to bridge micro- and nanofluidics.

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Applications Of Nanoimprint Lithography For Biochemical And Nanophotonic Structures Using Su-8