Abstract:High-aspect ratio x-ray absorption gratings are required for hard x-ray or high-resolution soft x-ray phasecontrast imaging (XPCi) applications. X-ray gratings play a central role in grating-based XPCi techniques, where visibility – image quality – is highly dependent on the quality of gratings. Although the fabrication process of x-ray gratings for soft x-ray imaging is well-developed, there are technological challenges in highresolution hard x-ray imaging that impede us from making high-aspect ratio large field-of-view fine x-ray gratings through conventional fabrication processes. Here we present a design and a fabrication process to fabricate highaspect ratio gratings that benefit from a self-aligned hard-mask – a patterned chromium-gold-chromium thin film deposited on a transparent ITO-on-glass substrate – which facilitates both lithography and electroplating processes. The repeatability of the proposed method makes it suitable for achieving high-aspect ratio fine structures as thick as desired through a multi-layer structure without any restraint or limitation on the aspect ratio of features. The multi-layer structure design overcomes the aspect ratio limitation associated with UVlithography. Although this method works well with X-ray lithography, the key advantage of this design is that it enables UV lithography for high-aspect ratio grating fabrication through a reliable yet simple process. To the best of our knowledge, self-aligned multi-layer SU-8 based grating design has not been previously reported. The proposed design and fabrication process help researchers further develop x-ray gratings performance to facilitate high-resolution coded-aperture and Talbot-Lau high-energy x-ray phase-contrast imaging.

High aspect ratio tungsten grating on ultrathin Si membranes for extreme UV lithography.

Design of Large-Deflection-angle High-Diffraction-efficiency High-Dispersion Hybrid Gratings

Design of Compact Wide-Band Triple Grating Imaging Spectrometer Based on Freeform Surfaces

Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching

Self-aligned fabrication of high-aspect ratio high-resolution x-ray gratings

A nanoimprint lithography for fabricating SU-8 gratings for near-infrared to deep-UV application

High‐Aspect‐Ratio Grating Microfabrication by Platinum‐Assisted Chemical Etching and Gold Electroplating

Fabrication of ultra-high aspect ratio silicon grating using an alignment method based on a scanning beam interference lithography system

The Design, Fabrication and Performance of A Large Area 10000 Line/Mm Metal Transmission Diffraction Gratings for Soft X-Ray

The fabrication of high-performance diffraction gratings via vibration-assisted UV nanoimprinting lithography

Fabrication of Angle-Gradient Echelle Grating on Metallic Glass Using Shaped Vibration Cutting with Time-Varying Trajectory

Toward volume manufacturing of high-performance soft x-ray critical-angle transmission gratings

Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating

High-Efficiency Multilayer-Coated Ion-Beam-Etched Blazed Grating in the Extreme-Ultraviolet Wavelength Region

Fabrication of 200nm period gold free-standing transmission gratings based on nanoimprint lithography

Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System

Large Area 50nm Period Grating by Multiple Nanoimprint Lithography and Spatial Frequency Doubling

Extreme Ultraviolet and Soft X-Ray Diffraction Efficiency of a Blazed Reflection Grating Fabricated by Thermally Activated Selective Topography Equilibration

Refined Grating Fabrication Using Displacement Talbot Lithography

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Fabrication of Slanted Gratings with High Refractive Index Starting from Master Nanoimprint Mold.