High-Efficiency Multilayer-Coated Ion-Beam-Etched Blazed Grating in the Extreme-Ultraviolet Wavelength Region

Hui Lin,Lichao Zhang,Lifeng Li,Chunshui Jin,Hongjun Zhou,Tonglin Huo
DOI: https://doi.org/10.1364/ol.33.000485
IF: 3.6
2008-01-01
Optics Letters
Abstract:We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An Mo/Si multilayer-coated specimen with a blaze angle of 1.9 degrees was fabricated and measured. At an incident angle of 10 degrees and a wavelength of 13.62 nm, the diffraction efficiency of the negative second order reaches 36.2%.
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