High‐Aspect‐Ratio Grating Microfabrication by Platinum‐Assisted Chemical Etching and Gold Electroplating

Lucia Romano,Joan Vila-Comamala,Konstantins Jefimovs,Marco Stampanoni
DOI: https://doi.org/10.1002/adem.202000258
IF: 3.6
2020-06-17
Advanced Engineering Materials
Abstract:Diffractive optics play a key role in hard X‐rays imaging for which many scientific, technological and biomedical applications exist. Herein, high aspect ratio microfabrication of gratings for X‐ray interferometry is demonstrated by using Pt as catalyst for metal assisted chemical etching of Si in a solution of HF and H2O2. The Pt layer has been thermally treated in order to realize a porous catalyst layer that stabilizes the etching of pattern with a pitch size from 4.8 to 20 µm in the direction perpendicular to the <100> Si substrate and an aspect ratio up to 60:1. The superior etching performance of Pt as catalyst and its stability in a solution with high HF content have been reported in direct comparison with Au catalyst for the same grating parameters. The Si structure is then used as a template for filling with Au, as a high absorbing X‐ray material. The Pt catalyst layer was used as a conductive seed for Au electroplating. The quality of the overall process has been assessed by obtaining the visibility map using 30 µm thick Au grating in a X‐ray interferometric set‐up at 20 keV.This article is protected by copyright. All rights reserved.
materials science, multidisciplinary
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