Abstract:High-aspect ratio x-ray absorption gratings are required for hard x-ray or high-resolution soft x-ray phasecontrast imaging (XPCi) applications. X-ray gratings play a central role in grating-based XPCi techniques, where visibility – image quality – is highly dependent on the quality of gratings. Although the fabrication process of x-ray gratings for soft x-ray imaging is well-developed, there are technological challenges in highresolution hard x-ray imaging that impede us from making high-aspect ratio large field-of-view fine x-ray gratings through conventional fabrication processes. Here we present a design and a fabrication process to fabricate highaspect ratio gratings that benefit from a self-aligned hard-mask – a patterned chromium-gold-chromium thin film deposited on a transparent ITO-on-glass substrate – which facilitates both lithography and electroplating processes. The repeatability of the proposed method makes it suitable for achieving high-aspect ratio fine structures as thick as desired through a multi-layer structure without any restraint or limitation on the aspect ratio of features. The multi-layer structure design overcomes the aspect ratio limitation associated with UVlithography. Although this method works well with X-ray lithography, the key advantage of this design is that it enables UV lithography for high-aspect ratio grating fabrication through a reliable yet simple process. To the best of our knowledge, self-aligned multi-layer SU-8 based grating design has not been previously reported. The proposed design and fabrication process help researchers further develop x-ray gratings performance to facilitate high-resolution coded-aperture and Talbot-Lau high-energy x-ray phase-contrast imaging.

Fabrication of High Aspect Ratio Silicon Gratings by Interference Lithography and Potassium Hydroxide Anisotropic Etch Technique

Alignment Method Combining Interference Lithography with Anisotropic Wet Etch Technique for Fabrication of High Aspect Ratio Silicon Gratings.

Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching

Fabrication of ultra-high aspect ratio silicon grating using an alignment method based on a scanning beam interference lithography system

Calibration Method of Silicon 〈111〉 Orientation and Its Application in Fabrication of Silicon Grating by Anisotropic Wet Etching

Self-aligned fabrication of high-aspect ratio high-resolution x-ray gratings

Vacuum-ultraviolet blazed silicon grating anisotropically etched in KOH solution

Fabrication of High-Aspect-ratio Grooves in Silicon Using Femtosecond Laser Irradiation and Oxygen-Dependent Acid Etching.

Fabrication of Slanted Grating Utilizing Reaction Ion Beam Etching: The Role of CHF<inf>3</inf> and O<inf>2</inf> Etching Atmosphere

A Novel Method to Fabricate Silicon Tubular Gratings with Broadband Antireflection and Super-Hydrophobicity

High aspect ratio tungsten grating on ultrathin Si membranes for extreme UV lithography.

Parallel Fabrication of High-Aspect-ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching

Fabrication of Very-High-Aspect-Ratio Micro Metal Posts and Gratings by Photoelectrochemical Etching and Electroplating

High‐Aspect‐Ratio Grating Microfabrication by Platinum‐Assisted Chemical Etching and Gold Electroplating

Fabrication of a New Type of Transmission Grating with Holography Interferometry and Wet Anisotropic Etching

Method for Increasing Duty Cycle of Photoresist Grating by Hot Pressing and Its Application

High Aspect Ratio Grating Fabrication in Su-8 Resist by Uv-Curing Nanoimprint

Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating

Fabrication of Nanoscale Gratings by Nanoimprint on Silicon Wafer

Study on Morphology of High-Aspect-Ratio Grooves Fabricated by Using Femtosecond Laser Irradiation and Wet Etching

Fabrication of 53.2 Nm Pitch Self-Traceable Gratings by Laser-Focused Atomic Deposition Combined with Extreme Ultraviolet Interference Lithography