The Impact of Correlation Between NBTI and TDDB on the Performance of Digital Circuits

Hong Luo,Yu Wang,Jyothi Velamala,Yu Cao,Yuan Xie,Huazhong Yang
DOI: https://doi.org/10.1109/mwscas.2011.6026408
2011-01-01
Abstract:With integrated circuits scale into the nano-scale era, aging effect becomes one of the most important design challenges. Both the biased temperature instability (BTI) and time-dependent dielectric breakdown (TDDB) can significantly degrade the performance of the circuits. In this paper, we consider the correlation between BTI and TDDB, and apply the correlation model to digital circuit analysis for the first time. The results show that the correlation can lead to 10.42% further more delay degradation.
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