Fabrication of superconducting magnesium diboride thin films by electron beam annealing

Xiangdong Kong,Qian Dai,Li Han,Qingrong Feng,Zhaoshun Gao,Yanwei Ma,Mingzhang Chu,Hong Xue,Jianguo Li,Furen Wang,Yibing Zhang
DOI: https://doi.org/10.1088/0953-2048/24/10/105013
2011-01-01
Abstract:The technique of electron beam annealing for fabricating MgB(2) thin films has been explored. MgB(2) thin films were prepared by e-beam evaporation of M-B precursor films on 6H-SiC (0001) substrates followed by ex situ electron beam annealing without any extra Mg vapor or argon gas protection. The very short annealing duration, about 1 s, effectively prevented volatilization and oxidation of Mg and decomposition of MgB(2). In comparison with the MgB(2) thin films grown by other techniques, our films show medium qualities including a superconducting transition temperature of T(c)(onset) similar to 35.3 K, a transition width Delta T(c) similar to 0.2 K, and a critical current density of J(c)(5 K, 0 T) similar to 3.2 x 10(6) A cm(-2). Such an electron beam annealing technique has potential for the fabrication of large-scale MgB(2) thin films as well as MgB(2) wires and tapes.
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