Abstract:The physical and optical properties of thin films strongly depend on the film deposition techniques. In this research, Cu 2 ZnSnS 4 (CZTS) thin films were prepared using the sol–gel method and deposited on three kinds of substrates (glass, indium-doped tin oxide (ITO), and fluorine-doped tin oxide (FTO)) by the simple spray pyrolysis method. The influence of the substrate and Cu concentration (0.1 and 0.07 mol/L) on the physical properties of the prepared thin films was examined. The study of X-ray diffraction (XRD) investigation showed that all CZTS thin films possess a single-phase kesterite crystal structure. Field emission scanning electron microscopy (FE-SEM) images showed that the surface of the films was uniform, dense, and had almost no voids, and the particle size of the prepared thin film with the substrate (ITO) was larger than the other samples. The prepared films exhibited an optical band gap ranging from 2 to 2.4 eV. The lowest and highest values of the optical gap correspond to the film with the substrate (ITO) having a lower Cu concentration and the prepared film with the glass substrate having a higher Cu concentration, respectively. The electrical properties and sheet resistance of CZTS thin films were investigated. The best results in terms of electrical properties were related to the ITO substrate with a Cu concentration of 0.1 mol/L. A photoluminescence study showed that the strongest emission peak in the 700–800 nm region was observed for CZTS thin film on ITO substrate. Obtained results indicating the possibility of using the CZTS thin films for efficient and low-cost solar cell and optical applications. Our findings demonstrate that ITO serves as a superior substrate for CZTS fabrication at room temperature. Our results provide an overview of the feasibility of manufacturing optoelectronic devices based on CZTS thin film. Substrate selection is critical in many applications.

Comparative study of the structural, optical, and electrical properties of CuAlO 2 thin films on Al 2 O 3 and YSZ substrates via chemical solution deposition

P-type Transparent Conducting Copper Aluminum Oxide Films with Different Cu/Al Ratio

Fabrication and Characterization of Y2O3 Stabilized ZrO2 Films Deposited with Aerosol-Assisted MOCVD

Comparison of UV optical and structural properties of Al2O3 and LaF3

Optical and Wetting Properties of CuAlO2 Films Prepared by Radio Frequency Magnetron Sputtering

Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

Synthesis of YSZ film by solid single source PE-MOCVD method and characterization

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Effects of Citric Acid on Properties of Single Phase CuAlO2 Thin Films Derived by Chemical Solution Deposition

Microstructure and Electrical Properties of Al-doped ZnO Thin Films

Influences of Film Thickness on the Structural, Electrical and Optical Properties of CuAlO2 Thin Films

Optical, electrical, and structural properties of Fe-doped CuAlO2 thin films

Studies on Morphology, Electrical and Optical Characteristics of Al-doped ZnO Thin Films Grown by Atomic Layer Deposition

Substrate and Cu concentration-dependent physical properties of spray-deposited Cu2ZnSnS4 thin films: a comparative study

Growth and Properties of P-Type Zn-Doped CuAlS_2 Films

A Comparative Study of Growth and Properties of Atomic Layer Deposited Transparent Conductive Oxide of Al Doped ZnO Films from Different Al Precursors

YBa2Cu3O7−y and YbBa2Cu3O7−y Superconducting Films Prepared by Chemical Solution Deposition on SrTiO3 (001) Substrate

Study on the effect of Sn concentration on the structural, optical, and electrical properties of (Al 0.55 In 0.45 ) 2 O 3 :Sn films

Preparation of Cualo2 Nanocrystalline Transparent Thin Films with High Conductivity

Optical, Structural and Thermal Characteristics of Cu–CuAl2O4 Hybrids Deposited in Anodic Aluminum Oxide As Selective Solar Absorber

Study on Aluminum Concentration on Optical and Electrical Properties of AZO Thin Films Fabricated by Ultrasonic Spray Pyrolysis