Growth and Properties of P-Type Zn-Doped CuAlS_2 Films

Zhang Qun,Li Guifeng,Shi Zhan,Tan Hua
DOI: https://doi.org/10.13922/j.cnki.cjovst.2008.03.007
2008-01-01
Abstract:CuAl0.9Zn0.10S2 transparent conducting films were deposited by channel spark ablation on glass substrates.The microstructures and physical properties were characterized with X-ray diffraction(XRD),and atomic force microscopy(AFM).The influence of the film growth conditions on its electrical and optical properties was studied.The results show that the fairly smooth and compact film behaves as a p-type semiconductor,and that the argon partial pressure and substrate temperature significantly affect the resistivity and carrier concentration of the films.For example,as the argon partial pressure increases,the resistivity decreases,then turns around and rises up;whereas the carrier concentration increases,turns around and drops down.Under optimized film growth conditions,the films with the lowest resistivity of 0.2 Ω·cm,the carrier concentration of 6.67×1018 cm-3 and the highest mobility of 1.06 cm2V-1S-1 have been obtained.At a substrate temperature of 500 ℃,the highest conductivity of 50.9 S·cm-1 was obtained.In the visible range,an averaged transmission was found to be better than 60%.
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