Abstract:For preparation of transparent conductive oxide (TCO)/metal/TCO tri-layer films, Cu and Ga-doped ZnO (GZO) films were respectively used as the metal and TCO layers and were deposited by magnetron sputtering at room temperature. The effect of film thickness on transparent conductive properties of single Cu films was first investigated in order to better understand the properties of tri-layer films. The results show that the resistivity, sheet resistance (R-s), average transmittance in visible light range (T(Vi)s), and figure of merit (FOM) of Cu films decrease with increasing film thickness. The investigations of effect of H-2 flux on the transparent conductive properties of GZO films show that hydrogenated GZO (HGZO) films have lower resistivity and higher TVis than those of GZO films. On basis of the investigation of single Cu and GZO films, the GZO/Cu/GZO (GcG) and HGZO/Cu/HGZO (HcH) tri-layer films were prepared, and their transparent conductive properties were investigated as a function of Cu and GZO (or HGZO) layer thickness. The results show that these two kinds of tri-layer films have the best FOM at Cu layer thickness of 7 nm and GZO (or HGZO) layer thickness of 40 nm. Compared with GcG tri-layer films, HcH tri-layer films have better FOM, indicating that introducing H-2 into sputtering atmosphere plays a significant role on the transparent conductive properties of the tri-layer films. In addition, bandgap (E-g) of single GZO and tri-layer films was discussed as a function of carrier concentration in the paper.

Growth and Properties of Cu-based Al-doped ZnO Multilayer Films

Fabrication and Properties of Transparent Conductive AZO/Cu Bilayer Films

Transparent conductive and near-infrared reflective Cu-based Al-doped ZnO multilayer films grown by magnetron sputtering at room temperature

Effect of Nucleation and Growth Kinetics on the Electrical and Optical Properties of Undoped ZnO Films

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Transparent conductive Al-doped ZnO/Cu bilayer films grown on polymer substrates at room temperature

Effect of Film Thickness on Properties of Al-Doped Zno Film As Transparent Conducting Electrodes in Oleds

Studies on Morphology, Electrical and Optical Characteristics of Al-doped ZnO Thin Films Grown by Atomic Layer Deposition

Optical and Electrical Properties of Al-doped ZnO Thin Films by Atomic Layer Deposition

Comparison of Structural and Optical Properties of ZnO Films Grown on Different Substrates at Low Temperatures

STRUCTURAL AND OPTICAL STUDIES OF ZnO FILMS GROWN AT LOW TEMPERATURE

Room-Temperature Growth and Properties of Transparent Conductive GZO/Cu/GZO Multilayer Thin Films

A Comparative Study of Growth and Properties of Atomic Layer Deposited Transparent Conductive Oxide of Al Doped ZnO Films from Different Al Precursors

Characteristics of Atomic Layer Deposited Transparent Aluminum-Doped Zinc Oxide Thin Films at Low Temperature

Microstructure and Electrical Properties of Al-doped ZnO Thin Films

Investigation of the optical and electrical properties of ZnO/Cu/ZnO multilayers grown by atomic layer deposition

Effect of the ZnO buffer layer thickness on AZO film properties

Transparent Conductive and Near-Infrared Reflective Ga-doped ZnO/Cu Bilayer Films Grown at Room Temperature

Transparent Conductive Al-Doped Zno Thin Films Grown at Room Temperature

Influence of Deposition Temperature on the Crystallinity of Al-doped ZnO Thin Films at Glass Substrates Prepared by RF Magnetron Sputtering Method

Improvement of Transparent Conductive Properties of GZO/Cu/GZO Tri-Layer Films by Introducing H2 into Sputtering Atmosphere