Optical, electrical, and structural properties of Fe-doped CuAlO2 thin films

Xueping Zhao,Ming Zhang,Pucun Bai,Xiaohu Hou,Fei Liu,Hui Yan
DOI: https://doi.org/10.1142/S1793604718501060
IF: 1.4901
2019-01-01
Functional Materials Letters
Abstract:The influence of Fe content on the structural and optoelectronic properties of Fe-doped CuAlO2 films was studied. X-ray diffraction (XRD) results revealed that all annealed films had a pure delafossite phase. Optical transmittance spectra showed that Fe-doped films exhibit an obvious change in the 340-380 nm region compared to undoped CuAlO2, and optical band gap analyses confirmed the formation of impurity band levels within the bandgap. The average transmittance of CuAl1-xFexO2 is around 45-55% in the visible range, and transmittance in this region decreases with increasing Fe concentration. Increased conductivity was observed due to the introduction of Fe and subsequent carrier concentration enhancement. The conductivity in a CuAl0.85Fe0.15O2 film was maximized at 1.10 x 10(-2) S cm(-1).
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