Influence of Annealing Conditions on Impurity Species in Arsenic-Doped Hgcdte Grown by Molecular Beam Epitaxy

Yue Fang-Yu,Chen Lu,Li Ya-Wei,Hu Zhi-Gao,Sun Lin,Yang Ping-Xiong,Chu Jun-Hao
DOI: https://doi.org/10.1088/1674-1056/19/11/117106
2010-01-01
Chinese Physics B
Abstract:Based on our previous work, the influence of annealing conditions on impurity species in in situ arsenic (As)doped Hg(1-x)Cd(x)Te (x approximate to 3) grown by molecular beam epitaxy has been systematically investigated by modulated photoluminescence spectra The results show that (1) the doped As acting as undesirable shallow/deep levels in as-grown can be optimized under proper annealing conditions and the physical mechanism of the disadvantage of high activation temperature, commonly assumed to be more favourable for As activation, has been discussed as compared with the reports in the As-implanted HgCdTe epilayers (x approximate to 0 39), (n) the density of V(Hg) has an evident effect on the determination of bandgap (or composition) of epilayers and the excessive introduction of V(Hg) will lead to a short-wavelength shift of epilayers, and (in) the V(Hg) prefers forming the V(Hg)-As(Hg) complex when the inactivated As (As(Hg) or related) coexists in a certain density, which makes it difficult to annihilate V(Hg) in As-doped epilayers As a result, the bandedge electronic structures of epilayers under different conditions have been drawn as a brief guideline for preparing extrinsic p-type epilayers or related devices
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