Strongly Enhanced Tunable Photoluminescence In Polymorphous Silicon Carbon Thin Films Via Excitation-Transfer Mechanism

wang junzhuan lpicm ecole polytechnique cnrs palaiseau,suendo v lpicm ecole polytechnique cnrs palaiseau,inorganic,natural sciences institut teknologi bandung bandung,a v abramov,yu linwei,pere roca i cabarrocas
DOI: https://doi.org/10.1063/1.3521280
IF: 4
2010-01-01
Applied Physics Letters
Abstract:Here, we investigate the enhanced tunable photoluminescence (PL) of hydrogenated polymorphous silicon carbon (pm-Si1-xCx:H) thin films fabricated in a plasma enhanced chemical vapor deposition system. The silicon nanocrystal (nc-Si) inclusions are formed during gas-phase nucleation and incorporated in the hydrogenated amorphous silicon carbon (a-SiC:H) matrix. The nc-Si provides high-quality recombination centers for the photogenerated carriers in the pm-Si1-xCx:H material, while the a-SiC:H matrix plays a role of sensitizer. We elucidate and provide experimental evidence for this excitation-transfer mechanism. Strongly enhanced PL performance can be achieved by effective matrix passivation that favors a diffusion-driven carrier recombination in the nc-Si centers. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3521280]
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