Optical Properties of Hydrogenated Silicon-Carbon Films and Greatly Enhanced Photoluminescence by Nanowire Structure

Ying CHENG,Zhongwei YU,Xiaoxu WEI,Huafeng YANG,Dan GUO,Junzhuan WANG,Linwei YU,Yi SHI
DOI: https://doi.org/10.11896/j.issn.1005-023X.2016.04.002
2016-01-01
Abstract:Hydrogenated silicon-carbon thin film (Six C1 -x ∶ H),as a wide-band semiconductor material,has very promising applications in opto-electronic areas.Series of Six C1 -x ∶ H films were prepared by using plasma-en-hanced chemical vapor deposition system (PECVD).By increasing the flux ratio of the gas source (R=CH4/SiH4 ),it is found that the peak position of the PL blue-shifts and PL intensity photoluminescence to the decrease in the size of Si nanoparticles (nc-Si)embedded in the matrix and the increase in the numbers of nc-Si.The precursor H 2 has influence on the PL intensity as the presence of H 2 can boost the nucleation and growth of the nc-Si.The optical properties of the films were analyzed by Ellipsometry and FTIR measurement.Importantly,3D nanowire structure of the film greatly enhanced the PL intensity,which provides another way to improve the PL efficiency.These results are funda-mentals for study on Si based opto-electronics.
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