Fabrication of Porous Oxide Film on Ti-Al PM Alloy Surface

曹华珍,朱施利,董虹星,郑国渠,贺跃辉
DOI: https://doi.org/10.3969/j.issn.1673-0224.2010.01.009
2010-01-01
Abstract:Well ordered and uniform porous oxide film was prepared by electrochemical anodic oxidation on the surface of Ti-Al powder alloy,using hydrofluoric acid and chromyl acid as electrolyte. The surface morphology and phases of oxide films were characterized with field emission scanning electron microscope (FESEM),X-ray diffractometer (XRD) and X-ray photoemission spectroscopy (XPS). The effect of electrolyte and oxidation voltage on the morphology of porous films was also investigated. The formation mechanism of porous oxide film was explored by electrochemical technology. Experimental results show that porous oxide film would not form in HF electrolyte without the addition of CrO3,contrarily serious corrosion will happen on the alloy surface. Both HF concentration and oxidation voltage affect the morphology of oxide film. Well ordered oxide porous film can be obtained in solution containing 0.2% HF(mass fraction),the average diameter of pores is ~50 nm. The porous film is regular when oxidation potential is 10 V,while the pore structure may be destroyed with the increasing of potential. The porous oxide film is mainly composed of amorphous TiO2,Al2O3 and small amount of crystalline Ti2O as well as Al. The growth of porous film experiences three stages:formation of barrier layer,initial formation of porous layer and stable growth of porous layer.
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