Enhanced Photoluminescence of Strained Ge with a Δ-Doping SiGe Layer on Silicon and Silicon-on-insulator

Cheng Li,Yanghua Chen,Zhiwen Zhou,Hongkai Lai,Songyan Chen
DOI: https://doi.org/10.1063/1.3275863
IF: 4
2009-01-01
Applied Physics Letters
Abstract:An enhancement of the direct bandgap photoluminescence from Ge layer on silicon with boron or phosphorous δ-doping SiGe layers at room temperature is reported. The n-type δ-doping SiGe layer is proposed to transfer extra electrons to L valley in Ge, which decreases the possibility of the excited electrons in the Γ valley to be scattered to the L valley, and improve the photoluminescence of the direct band transition in the Ge layer. Additionally, 2.5 fold enhancement of luminescence from the strained Ge layer on a silicon-on-insulator substrate is demonstrated due to the resonant effect. This investigation is very promising for efficient Si-based Ge light emitting diodes compatible with silicon technology.
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