Diagnosis of Arc Ion Plating Plasma by Langmuir Double Probes

Fangyuan Yuan,Wenqi Lu,Guoqiang Lin
DOI: https://doi.org/10.3969/j.issn.1672-7126.2009.05.11
2009-01-01
Abstract:A novel technique was developed to diagnose arc ion plating plasma with a Langmuir double probes. One advantage of newly-developed technique over the conventional one is that the small ion current detected by the double probes, much below the ion saturation limit, secures it from high density arc ion plating plasma. Anothcr is that the strong inherent fluctuation of the arc ion plating plasma was smoothed out by means of Discrete Fourier Transform (DFT) algorithm. In addition, the tip apex of the probe was designed in such a way that no deposition could result in short circuit between the tip and its support. The experimental results show that as the arc current and gas pressure increase, the plasma density increases, while its electron temperature changed little. Besides, the electron temperature and the plasma density, generated by the double-target, were found to be higher than those produced by the single-target.
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