Abstract:Inductively coupled plasmais widely used in semiconductor and display process because of its desirable characteristics such as high plasma density, simple structure and independently controllable ion energy. The driving frequency is a significant parameter that generates and maintains the plasma. However, the effects of different driving frequencies on the radial distribution of the plasma parameters are hardly investigated. So a large area cylindrical inductively coupled plasma source driven separately by 2 MHz and 13.56 MHz is investigated. In order to perform a comprehensive investigation about the effect of driving frequency, the radially resolved measurements of electron density, electron temperature and density of metastable state atoms for the argon discharge are systematically analyzed by Langmuir double probe and optical emission spectroscopy at various power values and gas pressures. It is found that input power values at high frequency (13.56 MHz) and low frequency (2 MHz) have different effects on plasma parameters. When discharge is driven at high frequency, the electron density increases obviously with the increase of power. However, when discharge is driven at low frequency, the electron temperature increases evidently with the increase of power. This can be explained by calculating the skin depths in high and low frequency discharge. When the discharge is driven at high frequency, the induced electromagnetic field is higher than that at low frequency, and the single electron obtains more energy. It is easier to ionize, so the energy is mainly used to increase the electron density. When the discharge is driven at low frequency, the skin layer is thicker, the number of heated electrons is larger, and the average energy of electrons is increased, so the energy is mainly used to raise the electron temperature. At a gas pressure of 10 Pa, the electron density shows a 'convex' distribution and increases with the increase of input power for both the high-frequency and low-frequency discharge. While the distributions of electron temperature are obviously different. When the discharge is driven at high frequency, the electron temperature is relatively flat in the center of the chamber and slightly increases on the edge. When the discharge is driven at low frequency, the electron temperature gradually decreases along the radial position. This is due to the one-step ionization in the high-frequency discharge and the two-step ionization in the low-frequency discharge. In order to prove that the low-frequency discharge is dominated by two-step ionization, the spectral intensities of the argon plasma under the same discharge conditions are diagnosed by optical emission spectroscopy. The number density of metastable states is calculated by the branch ratio method. The results are consistent with the analyses. At a gas pressure of 100 Pa, the electron density increases and then decreases with the increase of radial distance, and the overall distribution shows a " saddle shape" for high frequency and also for low frequency discharge. Although the uniformity of electron density improves with the gas pressure, the uniformity at low frequency is better than that at high frequency. The reason can be attributed to the fact that the skin layer of low frequency is thicker and the heating area is wider.

Diagnosis of Radio Frequency Induced Plasma with Langmiur Probe and Spectrum

Langmuir Probe Measurement and Theoretical Studies on Inductively Coupled Plasma in Ar-N-2 Discharge

Experimental Investigation of Plasma Parameters in 13.56 MHz/2 MHz Cylindrical Inductively Coupled Plasma

Experimental Investigations of the Plasma Radial Uniformity in Single and Dual Frequency Capacitively Coupled Argon Discharges

Diagnosis for the Parameters of Microwave Argon Plasma Using Emission Spectroscopy at Atmospheric Pressure

Diagnostic Study on the Electron Density Distribution of Microwave Plasma Jet in Vacuum Environment

Spatial Variation Behaviors of Argon Inductively Coupled Plasma During Discharge Mode Transition

Experimental investigation of the electromagnetic effect and improvement of the plasma radial uniformity in a large-area, very-high frequency capacitive argon discharge

The Emission Spectra Diagnosis in Microwave Argon and Argon-Air Plasmas

Axial Profiles of Argon Helicon Plasma by Optical Emission Spectroscope and Langmuir Probe

Experimental Studies of H2/Ar Plasma in a Cylindrical Inductive Discharge with an Expansion Region

Microwave Plasma Thruster Plume Diagnosis Using Microwave Interference Method

Experimental studies of H 2 /Ar plasma in a cylindrical inductive discharges with an expansion region

Characterization of O-2/Ar Inductively Coupled Plasma Studied by Using A Langmuir Probe and Global Model

Experimental and Simulation Investigation of Electrical and Plasma Parameters in a Low Pressure Inductively Coupled Argon Plasma

DIAGNOSTIC OF RF PLASMA BY USING LANGMUIR PROBE AND ITS NUMERICAL PROCESSING

Spectroscopic Investigation of the Argon Plasma Discharge in Quartz Capillary at Atmospheric Pressure

Spatial Distributions of Plasma Parameters in Inductively Coupled Hydrogen Discharges with an Expansion Region

Experimental study of spatial non-uniformities in a dual frequency capacitively coupled plasma

Diagnosis of electron density and temperature by using collisional radiative model in capacitively coupled Ar plasmas II: two-dimensional distributions

Plasma uniformity in a dual frequency capacitively coupled plasma reactor measured by optical emission spectroscopy