Plasma uniformity in a dual frequency capacitively coupled plasma reactor measured by optical emission spectroscopy

Guoli Zhao,Yong Xu,Jianping Shang,Wenyao Liu,Aimin Zhu,Younian Wang
DOI: https://doi.org/10.1088/1009-0630/13/1/13
2011-01-01
Abstract:Local measurement of plasma radial uniformity was performed in a dual frequency capacitively coupled argon plasma (DF-CCP) reactor using an optical probe. The optical probe collects the light emission from a small separate volume in plasma, thus enabling to diagnose the plasma uniformity for different experimental parameters. Both the gas pressure and the low-frequency (LF) power have apparent effects on the radial uniformity of argon plasma. With the increase in either pressure or LF power, the emission profiles changed from a bell-shaped to a double-peak distribution. The influence of a fused-silica ring around the electrodes on the plasma uniformity was also studied using the optical probe. Possible reasons that result in nonuniform plasmas in our experiments are discussed.
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