In-Situ Diagnosis of Ar Plasma Generated by Unequal Potential Hollow Cathode Discharge

Lizhen Yang,Yuefei Zhang,Xinchao Bian,Qiang Chen,Guangqiu Zhang
DOI: https://doi.org/10.3969/j.issn.1672-7126.2010.03.01
2010-01-01
Abstract:The argon plasma generated by unequal potential hollow cathode discharge was in-situ diagnosed by conventional photoemission spectroscopy. The impacts of various factors, including the pressure, the source electrode voltage, and the bias voltage, on the electron temperature and electron temperature distributions were experimentally studied. The results show that all three factors considerably affect the electron temperature. For instance, as the bias voltage increases, the electron temperature first drops down and then rises up, accompanied with a sharp temperature rise; and the high electron temperature in the middle gradually decreases outward. However, the small source electrode voltage little influences the electron temperature.
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