Abstract:Polysilicon serves as a primary raw material in the production of solar cells and semiconductors. However, its impurity content, particularly boron, poses significant challenges during the chemical vapor deposition (CVD) process. Therefore, it is essential to investigate the behavior of boron impurities during CVD. In this study, we conducted first-principles calculations to explore the adsorption behavior and deposition mechanism of boron-containing gases (BCl3, BHCl2, B2H6) on the Si(100) surface. We considered different adsorption sites and performed a systematic analysis of various adsorption systems' adsorption energy, charge transfer, and electronic properties. Our findings indicate that BCl3, BHCl2, and B2H6 molecules undergo dissociative chemisorption at specific adsorption sites. Moreover, charge transfer analysis confirms that each of these adsorbed molecules functions as an electron acceptor. Subsequent analyses, including total charge density (TCD), charge density difference (CDD), total density of states (TDOS), and projected density of states (PDOS), collectively underscore the robust electronic interactions between the gaseous molecules and the Si(100) surface. Through the computation of transition states and energy barriers across three potential reaction pathways, we identify a predominant sequence: BCl3 -> BCl2+Cl -> BCl+Cl -> B+Cl, that governs boron impurity formation on the Si(100) surface during CVD. Our work elucidates the underlying microscopic mechanisms of boron-containing gas adsorption and deposition in the CVD context.

Effect of Boron on Composition and Microstructure of the Siliconized Layers Prepared by Electrodeposition in Molten Salts

Effects Of Electrolytic Parameters On The Deposition Of Boron At The Cathode During Molten Salt Electrolysis Of Silicon

Formation and Oxidation Behavior of Mo-Si-B Composite Coatings with B-rich Interlayer Prepared by Slurry Sintering Method

Effects of boron content on the structure and magnetic properties of Fe81-xSi13BxMo2Cr1Cu1P2 nanocrystalline alloys

The Location and Doping Effect of Boron in Si Nanocrystals Embedded Silicon Oxide Film

Effect of Boron on the Formation of the Naturally Deposited Film and Its Corresponding Interfacial Heat Transfer Behavior in Strip Casting of Boron-Containing Steel

Reaction Mechanism and Kinetics of Boron Removal from Molten Silicon via CaO-SiO2-CaCl2 Slag Treatment and Ammonia Injection

Investigation of Microstructure and Photoelectric Properties of Boron- Doped Amorphous Silicon Films

Influence of Boron-doping on Electrical Properties of Na-Si:H Thin Film Prepared by PECVD

Effects of Strontium and Boron Interactions in Al-7si Alloys

A First-Principles Investigation into the Adsorption Behavior and Deposition Mechanism of Boron-Containing Gases on Si(100) Surfaces During Chemical Vapor Deposition

Distribution of Iron and Boron Between Silicon Metal Smelting Products in Industrial Saf using Borate Fluxes

Mechanism of Boron Removal Using Calcium Silicate Slag Containing CaCl2 under O2 Atmosphere

Effect of trace boron on corrosion resistance of rust layer of high-strength low-alloy steel in 3.5 wt.% NaCl solution

Borate configuration and surface pre-functionalization effects on the boronizing behavior and corrosion inhibition

Effects of Silicon Incorporation on Composition, Structure and Electric Conductivity of Cubic Boron Nitride Thin Films

Effect of Boron on Proeutectic Phase in Fe-0.77C-B Alloy Solidification Microstructure

Effect of carbon and nitrogen diffusion zone on growth mechanism of boride layer produced on Q235 Steel

Effects of boron addition on the high temperature oxidation of MoSi2 alloys

The Effect of Iron Oxide on the Formation of Boron Nitride Nanotubes

Effect of boron on microstructure evolution and properties of wear-resistant cast Fe–Si–Mn–Cr–B alloy