Effects of boron addition on the high temperature oxidation of MoSi2 alloys

Zhaoying Ding,Johannes C. Brouwer,Jia-Ning Zhu,Vera Popovich,Marcel J.M. Hermans,Willem G. Sloof
DOI: https://doi.org/10.1016/j.scriptamat.2023.115580
IF: 6.302
2023-09-01
Scripta Materialia
Abstract:Boron containing MoSi2 is a promising material for applications at high temperature, but the oxidation mechanism is still unclear. In this work, the high temperature (1100 °C) oxidation of B doped MoSi2 in synthetic air has been investigated. A (boro)silicate layer is formed on the surface of the alloy, which features a mixture of amorphous SiO2 and cristobalite. After an initial transient period, the oxidation kinetics follows a parabolic growth rate law. The growth rate constant of the oxide layer is enhanced by the boron in the alloy by 90 % per at.% B. The increase in growth rate is associated with boron mitigating the formation of cristobalite thereby promoting the formation of amorphous SiO2.
materials science, multidisciplinary,nanoscience & nanotechnology,metallurgy & metallurgical engineering
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