Formation of High Density TiN Nanocrystals and Its Application in Non-Volatile Memories

Li Xue-Lin,Feng Shun-Shan,Chen Guo-Guang
DOI: https://doi.org/10.1088/1674-1056/17/3/053
2008-01-01
Chinese Physics B
Abstract:Non-volatile memory based on TiN nanocrystal (TiN-NC) charge storage nodes embedded in SiO2 has been fabricated and its electrical properties have been measured. It was found that the density and size distribution of TiN-NCs can be controlled by annealing temperature. The formation of well separated crystalline TiN nano-dots with an average size of 5 nm is confirmed by transmission electron microscopy and x-ray diffraction. x-ray photoelectron spectroscopy confirms the existence of a transition layer of TiNxOy/SiON oxide between TiN-NC and SiO2, which reduces the barrier height of tunnel oxide and thereby enhances programming/erasing speed. The memory device shows a memory window of 2.5V and an endurance cycle throughout 10(5). Its charging mechanism, which is interpreted from the analysis of programming speed (dV(th)/dt) and the gate leakage versus voltage characteristics (I-g vs V-g), has been explained by direct tunnelling for tunnel oxide and Fowler-Nordheim tunnelling for control oxide at programming voltages lower than 9V, and by Fowler-Nordheim tunnelling for both the oxides at programming voltages higher than 9 V.
What problem does this paper attempt to address?