Fabrication, Characterization, and the Rectifying Properties of the Interfacial Structural Controlled LaSrMnO–Si Heterojunctions

K. Wang,X. D. Han,Z. Zhang,T. Li,M. Zhang,H. Yan
DOI: https://doi.org/10.1063/1.2831077
IF: 2.877
2008-01-01
Journal of Applied Physics
Abstract:The La0.9Sr0.1MnO3∕Si p-n junctions with optimized rectifying properties were synthesized using radio frequency magnetron sputtering followed by an in situ annealing process at a series of temperatures. The thickness of the SiOx barrier layer d determines the rectifying properties of the heterojunctions by Id3=constant (I is the rectifying current). The dead layer was determined to act as a semiconductor layer in the conduction process. The annealed samples show Mn4+ rich interface which correlated closely to the electrical transportation properties of the heterostructures. Lowering the annealing temperature, the electric sensitivity of the heterojunction can be significantly enhanced by simply tuning the thickness of the barrier layer.
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