Determining Band Offset and Interface Charge Density of Hydrogenated Nanocrystalline Silicon/crystalline Silicon Heterojunction Diode by C-V Matching Method

J. J. Lu,Z. Z. Jiang,J. Chen,Y. L. He,W. Z. Shen
DOI: https://doi.org/10.1117/12.792188
2008-01-01
Abstract:In this paper, we report the band offset and interface charge density properties of the nc-Si:H(n)/c-Si(p) heterojunction (HJ) diode by the capacitance-voltage (C-V) measurement and theoretical modeling. By employing the ideal anisotype HJ capacitance model and numerical C-V matching method, the band offset and heterostructure interface charge density of the nc-Si:H/c-Si HJ have been obtained and analyzed. An interface charge density on the order of 1011 cm-2 is estimated via the numerical C-V matching technique, and the low interface defect density has also been confirmed by the frequency insensitive C-f results.
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