Fabrication of a Reflective Mirror Within Wide Incidence Angles for Mid-Infrared Wavelength

Fengjuan Miao,Jie Zhang,Shaohui Xu,Lianwei Wang,Junhao Chu,Zhishen Cao,Peng Zhan,Zhenlin Wang
DOI: https://doi.org/10.1109/meta.2008.4723568
2008-01-01
Abstract:One-dimensional (1-D) photonic crystal with photonic band-gap based on porous silicon is fabricated with alternative etching currents during anodization. The microstructure was characterized by scanning electron microscopy and the optical reflectance spectra by Fourier transform infrared spectroscopy. A band-gap centered at 6 microns with a bandwidth of 3 microns has been successfully obtained. The prepared multilayer structure can reflect mid-infrared within a wide incidence angle up to 50deg. After proper oxidation process, its thermal properties can be improved significantly, and meanwhile the band-gap only slightly shifts to that centered at 5.7 microns. PECVD of Si3N4 is employed to improve the surface morphology in order to make the structure suitable to the fabrication of sensors. It is found that deposition of Si3N4 does not change the reflectance properties of the structures.
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