Abstract:In this work, effect of changing deposition rate on the structural properties, chemical bonds and wettability of the silicon carbon oxynitride thin films applied by radio frequency magnetron sputtering method on the silicon substrate was evaluated. GIXRD and Raman spectroscopy were performed in order to study the structure of the thin films and the formation of nanocrystals in the structure, respectively. The type of chemical bonds on the surface of the thin films were determined by ATR-FTIR Analysis. XPS was used to investigate the type of elements and the ratio of bonds formed in the structure of SiCON thin film. FESEM test was used to determine the surface morphology of the thin films. The ellipsometry test was conducted with the aim of checking the optical parameters of the thin films. Also, FTIR was used to determine the reflectivity of the samples in the infrared region. The roughness of the thin films was determined by an AFM test. The surface wettability of the thin films was evaluated by measuring the contact angle of the water droplet. The results of the GIXRD and Raman spectroscopy proved that thin films are nanocomposite with amorphous matrix and SiC reinforcement nanocrystalline particles. The ATR-FTIR determined the presence of hydrogen in the structure. FESEM test showed the formation of dense thin layer without any cracks. The results of the ellipsometry test proved that refractive index of the thin films changed with the change in the deposition rate in the range of 1.45–1.49. Also, AFM results showed that SiCON thin films are formed with very low surface roughness in the RMS range of 0.80–1.64 nm. Also, water contact angle measurement test determined that the thin films are hydrophilic.

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