Impact Factors On The Performance Of Schottky Barrier Mosfets With Asymmetric Barrier Height At Source/Drain

Du Xiong-Xiong,Sun Lei,Liu Xiao-Yan,Han Ru-Qi
DOI: https://doi.org/10.1109/ICSICT.2008.4734496
2008-01-01
Abstract:The performance of the n-channel Schottky barrier MOSFET with asymmetric barrier height at source/drain (A-SBFET) was numerically simulated. The impact factors on the performance are studied. The results suggest the on-state characteristics of the devices are mainly determined by the source-side barrier height (SBH). Increasing SBH or decreasing body thickness can optimize the sub-threshold slope, and decreasing SBH can enhance the on-state current.
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