Novel Schottky Barrier Mosfet with Dual-Layer Silicide Source/Drain Structure

DY Li,L Sun,ZL Xia,SD Zhang,XY Liu,JF Kang,RQ Han
DOI: https://doi.org/10.1109/icsict.2004.1434956
2004-01-01
Abstract:An n-channel Schottky barrier MOSFET with dual-layer silicide source/drain (DS-SB-MOSFET) has been proposed for nanoscale application. In this device, the stacked source and drain of SB-MOSFET are composed with two metal silicide layers. The Schottky barrier height of the top silicide/channel contact is lower than that of the bottom silicide/channel contact. The low Schottky barrier height of top silicide/channel contact near the gate oxide improves the electron injection capability in on-state. And the high Schottky barrier height of the bottom silicide/channel contact below the top silicide layer reduces the leakage current in off-state. Simulations indicated that the performance of DS-SB-MOSFET has been significantly improved, compared with that of the conventional Schottky barrier MOSFET (SB-MOSFET).
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