Vanadium oxide thin films prepared by reactive magnetron sputtering

FengJu Liu,Zhiming Yu,Shuang Chen,Mei Fang
DOI: https://doi.org/10.3321/j.issn:1002-185X.2008.12.034
2008-01-01
Rare Metal Materials and Engineering
Abstract:Vanadium oxide thin films were prepared on the substrates of glass and Si (100) by reactive magnetron sputtering and vacuum annealing. The phases and morphology were detected respectively by XRD and atomic force microscopy. The results showed. that when the oxygen volume percent (Po-2) was less than 15%, the films on the glass substrate were vanadium oxides with low-valences while on the silicon were textures Of V2O5(100) and V2O3(104). When Po-2 was more than 20%, the films on the both substrates were V2O5. V205 film on glass mainly, which annealed at 500 degrees C for 3 h, changed into VO2 and its roughness decreased distinctly. The film on Si (100) became textural V2O3(104) and its roughness hardly changed after annealing under 500 degrees C for 2 h. Key words: reactive magnetron sputtering; vacuum annealing; V2O3; VO2; V2O5
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