Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties
Xiang Dong,Yuanjie Su,Zhiming Wu,Xiangdong Xu,Zihao Xiang,Yuanlin Shi,Wenyu Chen,Jinhong Dai,Zhangying Huang,Tao Wang,Yadong Jiang
DOI: https://doi.org/10.1016/j.apsusc.2021.150138
IF: 6.7
2021-10-01
Applied Surface Science
Abstract:<p>In this study, vanadium oxide (VOx) thin films were prepared by reactive pulsed DC magnetron sputtering (PDMS). The influence of pulse frequency (F<sub>p</sub>) on the deposition process and properties of VOx films was investigated. The obtained results indicate that with the increase of F<sub>p</sub>, which not only can enhance the oxidation of vanadium but also can facilitate the formation of a denser microstructure and smoother surface morphology in the films. More importantly, films with composition from metal-rich to maximum stoichiometry can be accessed by tuning the F<sub>p</sub>, without varying any other parameters, especially, the flow rate of reactive gas. And temperature dependent electrical properties of the VOx films can also be tailored via the F<sub>p</sub> to fall in the desirable range for microbolometer applications. The impacts of F<sub>p</sub> on the reaction between V and O, thin film growth and some dynamic processes occurring during reactive PDMS were analyzed. The corresponding underlying mechanisms were discussed in detail. Our present work may provide a practical and effective way to develop the reactive sputtering towards hysteresis-free, and also paves the way for optimizing the reactive sputtered VOx films with desirable properties via F<sub>p</sub>.</p>
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films