Abstract:The principal methods for preparing VO2 films are: reactive sputtering, reactive evaporation, MOCVD and sol-gel methods. All these four methods have a common defect: high starting material cost. To overcome this defect is the purpose of this paper. The starting material currently used by sol-gel method is vanadium alkoxide. The authors' opinion is that several vanadium oxides can also be used as starting material. There also exist many methods for making sol from vanadium oxides. After much exploration and testing, the authors accomplished two unseparably connected things: (1) one kind of vanadium oxide is found to be satisfactory for the authors' purpose; (2) one method of preparing sol is found to be satisfactory for the authors' purpose. Starting from this sol and employing the well known dip-coating process, the authors succeeded in preparing a vanadium oxide film that possesses reversible phase transition property. Such a film exhibits typical VO2 properties, among which electrical properties are comparable to those of similar films prepared in well-equipped laboratories in the world. The authors studied preliminarily the chemical composition and electrical properties of the film prepared by them. The results of analysis of ESCA of the film show that in such a film VO2 is about 60%, and the rest includes several kinds of lower-valence vanadium oxides. The electrical resistance switching of the film is demonstrated. Around 60��C an abrupt drop of electrical resistance by two to three orders of magnitude is achieved.

Study on Preparation Technique and Characteristics of Vanadium Oxide Thin Films

Preparation and Characteristics of Vanadium Oxide Thin Films by Controlling the Sputtering Voltage

Study of Preparation and Characteristics Optimization of VO2 (B) Thin Films

Vanadium Oxide Thin Films Prepared by Rf Magnetron Sputtering Method

Effects of Deposition Parameters on the Properties of VO2 Thin Films

Fabrication of vanadium dioxide films at low temperature and researches on properties of the films

Studies of Vanadium Pentoxide Thin Films Prepared by R.F. Magnetron Sputtering Methods

Vanadium oxide thin films prepared by reactive magnetron sputtering

Study of Magnetron Sputtering of Vanadium Oxide Thin Films

Studies of Vanadium Oxide Thin Films Prepared by R.F.Magnetron Sputtering Methods

Controlling the Growth of VOx Films for Various Optoelectronic Applications

Study on Microstructure of Vanadium Oxide Thin Films

Effects of Duty Cycle and Oxygen Flow Rate on the Formation and Properties of Vanadium Oxide Films Deposited by Pulsed Reactive Sputtering

Microstructural Features, Electrical and Optical Properties of Pulsed-Sputter Deposited V2O5 Thin Films

New method for preparing VO2 films

Study of A New Sol-Gel Spin-Coating Technology and Thermal-Resistance Properties for Vanadium Oxide Thin Films

Study on Optical Properties of Vanadium Oxide Film Prepared by Reactive Magnetron Sputtering

Growth of Vanadium Oxide Thin Films for Microbolometer

Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties

Effect of Temperature on the Growth of Vanadium Oxide Films Deposited by DC Reactive Magnetron Sputtering

Electrical and Optical Properties of Nanostructured VOX Thin Films Prepared by Direct Current Magnetron Reactive Sputtering and Post-Annealing in Oxygen