Studies of Vanadium Oxide Thin Films Prepared by R.F.Magnetron Sputtering Methods

李志栓,李静,吴孙桃,郭东辉,徐富春

DOI: https://doi.org/10.3321/j.issn:0438-0479.2005.01.010

2005-01-01

Abstract:The vanadium oxide thin films have been prepared by R.F.magnetron sputtering at different substrate temperatures and sputtering powers,then annealed in the ambient of pure Ar.The samples have been investigated by X-ray diffraction,X-ray photoelectron spectroscopy,and the Laser Scanning Confocal Microscope images.XRD analysis exhibits that the samples show amorphous state before annealing and crystalline state after annealing,which is validated by the images of the Laser Scanning Confocal Microscope.Comparing the XRD patterns of the samples after annealing,we can find that better crystalline states and better crystalline orientation with V_2O_5 (001) after annealing can be obtained through properly decreasing substrate temperature or increasing sputtering power;Comparing the XPS spectra of the samples before annealing,we can find that the proportions of high valence vanadium oxides can be increased by properly increasing substrate temperature or reducing sputtering power.