Study on Optical Properties of Vanadium Oxide Film Prepared by Reactive Magnetron Sputtering

XIONG Hao,WU Zhi-ming,JIANG Ya-dong,WEI Xiong-bang,PU Juan
DOI: https://doi.org/10.16818/j.issn1001-5868.2008.06.022
2008-01-01
Abstract:Vanadium oxide thin films were deposited on Si substrates in different deposition time (5~100 min) by DC reactive magnetron sputtering. The structural properties of the films were studied by scanning electron microscopy (SEM). In the technique, a spectroscopic ellipsometry(SE) dispersion model was proposed. After studying the optical properties of the films by measuring and fitting their transmittance spectra with Lorentz oscillator model (classical model), good fitting results can be obtained. The results suggest that the refractive index n grows with the increase of wavelength in the range of 300~450 nm while decreases in the range of 450~700 nm. n value for vanadium oxide thin films measured at 632.8 nm falls in the range of 2.2~2. 5. It is found that the refractive index n of films with different thickness decreases regularly from 2.43 to 2.24 as the increase of deposition time.
What problem does this paper attempt to address?