Abstract:Vanadium oxynitride (VN x O y , x+y=1) is a metallic compound between vanadium oxides (VO, V 2 O 3 , V 2 O 5 ) and vanadium nitride (VN) which would have interesting properties and functions that potentially can be supplied for different applications. In this study, vanadium nitride and oxynitride thin films were obtained by reactive magnetron sputtering using vanadium targets, Ar as plasma carrier, and a mix of N 2 and O 2 as reactive gas. The ratio of mass flow between the two gases is maintained around O 2 :N 2 =1:20 during the process. To obtain crystalline phases of oxynitrides a post rapid thermal annealing (RTP) in Ar atmosphere at 600oC and 700oC for 5 minutes was done. The purpose of the study is to define the effect of the magnetron sputtering parameters, such as reactive gas flow rates, and annealing temperature on the composition, microstructure, and optical properties of the obtained vanadium oxynitride thin films. The characterization of obtained films includes the examination of thickness and morphology by the surface profiler and SEM; identifying crystal structures and further microstructural vibration modes of molecular polarizability by X-ray diffraction and Raman spectroscopy, respectively; evaluation of the chemical composition of films by XPS analysis; assessing of optical transmittance, reflectance, and absorbance by the UV-visible- NIR spectrometer. Experimental data reveal that the annealed films can be oxynitrides when the oxygen flow rate is below 0.25 sccm and the ratio of oxygen/nitrogen ≤1/20. The annealed vanadium oxynitride films in terms of their properties are closer to vanadium nitrides than to oxides: more metallic than semi-conductive with dark appurtenance and high optical absorbance across the spectrum between 200 and 900 nm. The optical absorbance reaches almost 90% around 300 nm and then slowly reduces to 70% at 900 nm. Thus, these films could be good optical shields. For practical usage, the deposition of O 2 :N 2 =1/20, O 2 <0.25 sccm, and 600oC annealing are recommended because of the truly low transmittance (<10%) through films.

Theoretical Investigation of Vanadium Oxide Film with Surface Microstructure

Patterned Sub-Wavelength Structure on Vanadium Oxide Film Enhancing Dual-Band Absorption

Study of the Phase Evolution, Metal-Insulator Transition, and Optical Properties of Vanadium Oxide Thin Films

Simulation of the Optical Properties of the Vanadium Oxide Thin Films by Effective Medium Theory

Study on Optical Properties of Vanadium Oxide Film Prepared by Reactive Magnetron Sputtering

Study on Microstructure of Vanadium Oxide Thin Films

Optical properties of vanadium dioxide thin film in nanoparticle structure

Femtosecond Laser-Induced Vanadium Oxide Metamaterial Nanostructures and the Study of Optical Response by Experiments and Numerical Simulations

Deep-scan Analysis of Composition and Valence of Vanadium Oxide Thin Film

Design of Two-Dimensional Organic-Inorganic Heterostructures for High-Performance Electromagnetic Wave Absorption

Correlation and surface effects in Vanadium Oxides

In Situ Preparation of VO2 Films with Controlled Ionized Flux Density in HiPIMS and Their Regulation of Thermal Radiance

Inverse design and optical vortex manipulation for thin film absorption enhancement

Evolution of Structures and Optical Properties of Vanadium Oxides Film with Temperature Deposited by Magnetron Sputtering

Enhanced Optical Absorption in VO2 Film Using Photonic Crystal

(Digital Presentation) Fabrication and Characterization for Vanadium Oxynitride Thin Films By Magnetron Sputtering

Review for metamaterials and metasurfaces based on vanadium dioxide phase change materials

Vanadium oxide surface studies

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In Situ Preparation of VO 2 Films with Controlled Ionized Flux Density in HiPIMS and Their Regulation of Thermal Radiance

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