Abstract:A series of VO2 films with different thicknesses (from about 25 nm to 250 nm) were prepared on sapphire substrates by radio frequency magnetron sputtering. The deposition times varied from 15 min to 150 min. The metal to insulator transitions (MIT) of the films were studied. The optical transmittance of the films to infrared light (with a wavelength of 4.0 µm) at room temperature (30°C) varied significantly with film thickness, ranging from 86.53% to 41.01%. The modulation property also changes with thickness, decreasing from 22.89% to 14.74%. The phase transition temperature remained approximately 70°C during heating, and approximately 53°C during cooling, despite a tenfold increase in the deposition time, and the resulting thickness of the films. Raman spectroscopy of the films indicated that the intensities of the characteristic peaks corresponding to V2O5 increase with the increasing of film thickness. Temperature-dependent Raman spectroscopy indicated that the peaks corresponding to VO2 undergo reversible changes during heating and cooling of the films, while the peaks corresponding to V2O5 remain unchanged throughout. Careful control of the V2O5 content of the films (by varying the duration of the deposition process) allows control over their transmittance and optical modulation properties without changes in the phase transition temperature. This provides a new method of controlling the optical properties of these materials and shows promise for their potential applications in thermochromic windows.

Growth Mode and Texture Study in Vanadium Dioxide Thin Films Deposited by Magnetron Sputtering

New Growth Mode of Vanadium Dioxide Films

Growth, Electrical, and Optical Properties of Nanocrystalline Vo2 (011) Thin Films Prepared by Thermal Oxidation of Magnetron Sputtered Vanadium Films

Growth of ultra thin vanadium dioxide thin films using magnetron sputtering

Growth of A-Axis Oriented Vanadium Dioxide Polycrystals on Glass Substrates

Effect of Temperature on the Growth of Vanadium Oxide Films Deposited by DC Reactive Magnetron Sputtering

Effects of Thickness on the Nanocrystalline Structure and Semiconductor-Metal Transition Characteristics of Vanadium Dioxide Thin Films

Substrate Effect on the Growth and Thermal Electrical Properties of Vanadium Oxide Thin Films

Study on Microstructure of Vanadium Oxide Thin Films

Growth of Vanadium Dioxide Thin Films on Pt Metal Film and the Electrically-Driven Metal-Insulator Transition Characteristics of Them

Controlling the Growth of VOx Films for Various Optoelectronic Applications

Study of nanocrystalline VO2 thin films prepared by magnetron sputtering and post-oxidation

Synthesis of Vanadium Dioxide Thin Films on Conducting Oxides and Metal–insulator Transition Characteristics

Evolution of Structures and Optical Properties of Vanadium Oxides Film with Temperature Deposited by Magnetron Sputtering

Study on Optical Properties of Vanadium Oxide Film Prepared by Reactive Magnetron Sputtering

Thermochromatic vanadium dioxide (VO2) thin films synthesized by atomic layer deposition and post-treatments

Growth and Physical Properties of Vanadium Oxide Thin Films with Controllable Phases

Effect of thickness on infrared optical property of VO2 film deposited by magnetron sputtering

Thickness Effect on Electrical Characteristics of Vanadium Oxide Thin Films

Electrical and Optical Properties of Amorphous Vanadium Oxide Thin Films Deposited by Dc Magnetron Sputtering

Semiconductor-Metal Phase Transition Properties and Growth Texture of Vanadium Dioxide Films on Si3n4 Layer