Model analysis of sub-aperture stitching interferometry for aspheric surface test

Qiao Yujing,Tan Jiubin,Wang Weibo
DOI: https://doi.org/10.3321/j.issn:0254-3087.2007.10.028
2007-01-01
Abstract:Aspheric wavefront is a kind of aberration wavefront relative to the spherical. During asphere surface test, there are some wavefront errors brought by adjustment errors. This paper presents a new method to minimize the mismatch based on calibrating multi-order aberration errors and establishes the phase relationship model for the apertures to be stitched. By using stepwise regress, the weight of effect of wavefront aberration error on stitching accuracy is determined. The asphere measurement model of optimized SSI test is established, and better wavefront reconstruction result is obtained. Simulation analysis shows that theoretically, the fitting precision of the new measurement model is higher than traditional measurement model. Further more, the result of simulation test experiment shows that the new measurement model based on calibrating aberration can satisfy the need of high precision asphere metrology.
What problem does this paper attempt to address?