Optical and Electrical Properties of Highly Nitrogen-Doped Zno Thin Films Grown by Plasma-Assisted Molecular Beam Epitaxy

Shujie Jiao,Youming Lu,Zhengzhong Zhang,Binghui Li,Bin Yao,Jiying Zhang,Dongxu Zhao,Dezhen Shen,Xiwu Fan
DOI: https://doi.org/10.1063/1.2819367
IF: 2.877
2007-01-01
Journal of Applied Physics
Abstract:Nitrogen-doped ZnO thin films with different nitrogen concentrations were fabricated by plasma-assisted molecular beam epitaxy. Hall effect measurements show p-type conduction for samples with low doping concentration. In highly doped ZnO, the p-type conduction converted to high resistance or unstable p-type behavior. This result indicates that highly doped samples are heavily compensated. In the low temperature photoluminescence spectrum, a donor-acceptor pair (DAP) emission band shows a strong redshift and broadening with increasing nitrogen doping concentration. The large shift of the DAP emission is explained by the Coulomb-potential fluctuation model related to compensated semiconductors.
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