Abstract:The evolution of surface morphologies of films prepared by ion-based deposition techniques has been investigated by atomic force microscopy. Two deposition processes, filtered arc deposition (FAD) and ion-beam-assisted deposition, where low-energy (<100 eV) ion irradiation and high-energy (several tens of keV) ion-beam bombardment concurrent with film growth were involved, respectively, have been employed to prepare TiN and Al films. Comparative studies on the effect of energetic ions on the development of topography have been performed between the low-ion-energy regime and high-ion-energy regime. In addition, the relationship between topography and mechanical properties of thin films has been revealed, by involving thin films prepared by thermal evaporation deposition (TED), where almost all depositing particles are neutral. In the images of the TED TiN and Al films, a large number of porous and deep boundaries between columnar grains was observed, suggesting a very rough and loose surface. In contrast, the FAD films exhibited much denser surface morphologies, although still columnar. The root-mean-square roughness of the FAD films was less than 1 Å. Hardness test and optical parameter measurement indicated that the FAD films were much harder and, in the case of optical films, much more transparent than the TED films, which was considered to arise from the denser surface morphologies rather than crystallization of the films. The high density and super smoothness of the FAD films, and the resultant mechanical and optical properties superior to those of the TED films, were attributed to the enhancement of surface migration of the deposited adatoms in the FAD process, which could provide intensive low-energy ion irradiation during film growth. As for topography modification by high-energy ion-beam bombardment concurrent with film growth, in addition to the increase of surface diffusion due to elastic collision and thermal spikes, physical sputtering must be considered while explaining the development of the film topography. Both surface migration enhancement and sputtering played important roles in the case of high-energy heavy-ion-beam bombardment, under which condition surface morphology characterized by dense columns with larger dimension and deep clean boundaries was formed. However, under high-energy light-ion-beam bombardment, the sputtering was dominant, and the variation of sputtering coefficient with position on the surface of growing film led to the formation of cones.

Effects of Deposition Rate on Surface Topography of Ni-Cr Thin Film Deposited by EB-PVD

Fractal Description of Surface Topography of Ultrathin Au Films

Atomic Force Microscopy Study on Topography of Films Produced by Ion-Based Techniques

Effect of processing conditions on microstructure and electrical characteristics of Ni thin films

Effect of Ni film structure and surface morphology on the growth of graphene by PECVD

CHARACTERISTICS OF Ag THIN FILMS DEPOSITED ON THE FRACTAL SUBSTRATES OF Α-Al２ｏ3 CERAMICS

Growth of Ni and Ni-Cr alloy thin films on MgO(001): Effect of alloy composition on surface morphology

Effects of Cr buffer layer thickness on the microstructure and the properties of Ni thin films deposited on polyimide substrate

Fractal features of carbon-nickel composite thin films

Effect of C2h2 Flow Rate on the Deposition of Zr-Zrc-Zrc/Dlc Gradient Nano-Composite Film on Biomedical Niti Alloy

SURFACE MORPHOLOGY AND CRYSTALLIZATION BEHAVIOR-OF AMORPHOUS NiNi88P12 ALLOY FILM

Investigation of microstructural, micromorphology, and surface plasmon resonance characteristics in Ni/Al, Ni/Cu, and Ni/SS thin films

Interface and crystallization evolution induced by reactive nitrogen and oxygen sputtering in Ni/Ti multilayer

Kinetic Surface Roughening of Electrodeposited Amorphous PdP and NiP Films – A Comparative Study

Effect of deposition time on tribological and adhesion characteristics of niobium nitride thin films

A molecular dynamics study of nickel vapor deposition: Temperature, incident angle, and adatom energy effects

Structure and mechanical properties of CrN thick films deposited by high-rate medium-frequency magnetron sputtering

Substrate Temperature Effect on Growth Behavior and Microstructure-Properties Relationship in Amorphous Ni-Nb Thin Films

Effects of different incidence rates of carbon and silicon clusters on the surface properties of SiC films

Effect of Deposition Parameters on Micromechanical Properties and Machining Performance of CrN Coating for Wet Finish Turning of Ti6Al4V Alloy

Temperature effect on structural, mechanical properties and corrosion behaviour of CrN thin films deposited by magnetron sputtering