Dual Material Gate SOI MOSFET with a Single Halo

Li Zunchao,Jiang Yaolin,Wu Jianmin
DOI: https://doi.org/10.3969/j.issn.1674-4926.2007.03.003
2007-01-01
Chinese Journal of Semiconductors
Abstract:In order to suppress drain-induced barrier lowering in dual material gate SOI MOSFETs, halo doping is used in the channel near the source. Two-dimensional analytical models of surface potential and threshold voltage for the novel SOI MOSFET are developed based on the explicit solution of the two-dimensional Poisson's equation. Its characteristic improvement is investigated. It is concluded that the novel structure exhibits better suppression of drain-induced barrier lowering and higher carrier transport efficiency than conventional dual material gate SOI MOSFETs. Its drain-induced barrier lowering decreases with increasing halo doping concentration but does not change monotonically with halo length. The analytical models agree well with the two-dimensional device simulator MEDICI.
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