Fabrication of Titanium Dioxide Thin Films by DBD-CVD under Atmosphere

Zhang Xiwen,Guo Yu,Han Gaorong
DOI: https://doi.org/10.1088/1009-0630/9/6/07
2007-01-01
Abstract:Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD (di-electric barrier discharge enhanced chemical vapor deposition) technique.The structure of thefilms was investigated by X-ray diffraction (XRD),scanning electron microscopy (SEM).TiO2films deposited under atmosphere pressure show preferred orientation,and exhibit columnar-likestructure,while TiO 2 films deposited under low gas pressure show no preferred orientation.Thecolumnar-like structure with preferred orientation exhibits higher photocatalytic efficiency,sincethe columnar structure has larger surface area.However,it contributes little to the improvementof hydrophilicity.DBD-CVD is an alternative method to prepare photocatalytic TiO 2 for itswell-controllable property.
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