Non-invasive in-situ monitoring of deep etching processes using terahertz metasurfaces
Lingyun Zhang,Chenguang Ouyang,Peng Wang,Hang Liu,Jinglei Wen,Chenzi Wang,Bo Ma,Chi Zhang,Fei Xing,Jiahao Zhao,Rui You,Kebin Fan,Xiaoguang Zhao,Zheng You
DOI: https://doi.org/10.1364/oe.541662
IF: 3.8
2024-12-13
Optics Express
Abstract:Lingyun Zhang, Chenguang Ouyang, Peng Wang, Hang Liu, Jinglei Wen, Chenzi Wang, Bo Ma, Chi Zhang, Fei Xing, Jiahao Zhao, Rui You, Kebin Fan, Xiaoguang Zhao, Zheng You This study presents an in-situ and non-invasive process control and monitoring (PCM) method for deep silicon etching, leveraging terahertz ... [Opt. Express 32, 46999-47010 (2024)]
optics