Substrate Temperatures and Gd2O3-Doped CeO2 Electrolyte Film Growth by Reactive RF Magnetron Sputtering

Binkui Hao,Xuening Jiang,Qingyu Zhang,Chonglin Chen
DOI: https://doi.org/10.3969/j.issn.1672-7126.2006.z1.033
2006-01-01
Abstract:CeO2 electrolyte films doped with Gd2O3 (GDC) were grown by reactive RF magnetron sputtering of Gd/Ce metallic target on n-type Si(l00) substrate. The films were characterized with X-ray diffraction and atomic force microscopy. The results show that the substrate temperature significandy affects its microstructures, its deposition rate and its stoichiometry. The f.c.c. structure dominates in the GDC solid solution films, grown at different substrate temperatures, with small portion of b.c.c. Gd2O3 interphase. The preferential growth orientation depends on the substrate temperature. For example, (220) and (111) preferential growth orientations are observed at 500°C, and 700%, respectively. Moreover, the more pronounced the (220) preferred growth orientation, the higher the deposition rate and the rougher the surface. As substrate temperature rises, islands coalesce and grow into larger ones on the surface.
What problem does this paper attempt to address?