Abstract:The evolution of surface morphologies of films prepared by ion-based deposition techniques has been investigated by atomic force microscopy. Two deposition processes, filtered arc deposition (FAD) and ion-beam-assisted deposition, where low-energy (<100 eV) ion irradiation and high-energy (several tens of keV) ion-beam bombardment concurrent with film growth were involved, respectively, have been employed to prepare TiN and Al films. Comparative studies on the effect of energetic ions on the development of topography have been performed between the low-ion-energy regime and high-ion-energy regime. In addition, the relationship between topography and mechanical properties of thin films has been revealed, by involving thin films prepared by thermal evaporation deposition (TED), where almost all depositing particles are neutral. In the images of the TED TiN and Al films, a large number of porous and deep boundaries between columnar grains was observed, suggesting a very rough and loose surface. In contrast, the FAD films exhibited much denser surface morphologies, although still columnar. The root-mean-square roughness of the FAD films was less than 1 Å. Hardness test and optical parameter measurement indicated that the FAD films were much harder and, in the case of optical films, much more transparent than the TED films, which was considered to arise from the denser surface morphologies rather than crystallization of the films. The high density and super smoothness of the FAD films, and the resultant mechanical and optical properties superior to those of the TED films, were attributed to the enhancement of surface migration of the deposited adatoms in the FAD process, which could provide intensive low-energy ion irradiation during film growth. As for topography modification by high-energy ion-beam bombardment concurrent with film growth, in addition to the increase of surface diffusion due to elastic collision and thermal spikes, physical sputtering must be considered while explaining the development of the film topography. Both surface migration enhancement and sputtering played important roles in the case of high-energy heavy-ion-beam bombardment, under which condition surface morphology characterized by dense columns with larger dimension and deep clean boundaries was formed. However, under high-energy light-ion-beam bombardment, the sputtering was dominant, and the variation of sputtering coefficient with position on the surface of growing film led to the formation of cones.

Study of High Quality Hydrophobic Fluorocarbon Polymer Films Grown by Inductive Coupled Plasma Chemical Vapor Deposition

Surface-Morphology-Induced Hydrophobicity of Fluorocarbon Films Grown by a Simultaneous Etching and Deposition Process

Preparation and Characterization of PVDF Film with Self-cleaning Property

Characterization of fluoropolymer films deposited by magnetron sputtering of poly(tetrafluoroethylene) and plasma polymerization of heptadecafluoro‐1‐decene (HDFD) on (100)‐oriented single‐crystal silicon substrates

Structural Investigation And Barrier Properties Of A-C : H Thin Films On Polymer By Pecvd

Growth and Characterization of Fluorocarbon Thin Films from Low Pressure Tetrafluoromethane, Hexafluoroethane and Octafluorocyclobutane Plasmas

High vapour barrier thin films deposited by R.F.-discarge plasma enhanced CVD

Synthesis of Fluorinated Polyester Used for Hydrophobic Coating: Influence of Fluoroalkyl Group Length on Enrichment Behavior

Preparation and fluorine enrichment behavior of fluorinated polyester

Synthesis and characterization of fluorine-containing polyester based on phthalic anhydride and tetrafluoropropyl glycidyl ether

Surface Wettability Control and Fluorination Modeling of Amorphous Carbon Films Fluorinated with CF 4 Plasma

Atomic Force Microscopy Study on Topography of Films Produced by Ion-Based Techniques

Growth of Si-C-H film by RF plasma enhanced chemical vapor deposition

Synthesis Of Fluoroalkyl-Modified Polyester And Its Application In Improving The Hydrophobicity And Oleophobicity Of Cured Polyester Coatings

The characterization of fluorocarbon films on NiTi alloy by magnetron sputtering

Synthesis and texturization processes of (super)-hydrophobic fluorinated surfaces by atmospheric plasma

An amorphous SiCOF film with low dielectric constant prepared by plasma-enhanced chemical vapor deposition

Analysis of formation mechanism of deposited film in a high-aspect-ratio hole during dry etching using fluorocarbon gas plasmas

Fluffy Polyfluoroalkoxy Layer Produced by Air Plasma Spraying Based on “grapeshot” Effect

Study on Plasma Polymerization of 1.1.1-Trifluoroethane: Deposition and Structure of Plasma Polymer Films

Deposition of hydrogenated amorphous carbon films by CH4/Ar capacitively coupled plasma using tailored voltage waveform discharges