The Effects of Zr Underlayer on the Microstructure and Properties of Al Films

LI Dong-mei,WANG Xu-bo,PAN Feng,NIU Hao-bin,LIU Ming
DOI: https://doi.org/10.3969/j.issn.1004-2474.2005.02.018
2005-01-01
Abstract:In order to improve the the power durability and adhesion of Al films in high-frequency surface acoustic wave(SAW)devices,and to obtain fine-dimensional control and etching pattern in dry etching process,Al films with Zr underlayer were evaporated in electro beam evaporation system.The effects of Zr underlayer and harden techniques of the films on microstructure,morphology,electronic properties and mechanical properties were investigated.The results show that the texture of Al films and their adhesion to substrates are largely improved when the thickness of Zr underlayer is between 5 and 30 nm.The resistivity of Al films also decreases after annealing treatment at 200 °C.The Al electrodes with Zr underlayer can be easily formed in reactive ion etching process.
What problem does this paper attempt to address?