THE FORMATION BEHAVIOR OF THERMAL DONORS IN CAST MULTICRYSTALLINE SILICON

Zhengfeng Yu,Zhenqiang Xi,Deren Yang,Duanlin Que
DOI: https://doi.org/10.3321/j.issn:0254-0096.2005.04.025
2005-01-01
Abstract:The formation behavior of thermal donors (TD) in cast multicrystalline silicon was investigated by the means of four-probe resistivity measurement and Fourier transmission infrared spectroscopy (FTIR). High concentration of TD formed in the specimens with high concentration of oxygen, and high density of dislocation and low concentration of carbon were found. The results indicated that dislocations enhance the formation of TD and grain boundaries hardly influence it, while carbon noticeably restrains TD formation. It was also found that the pre-annealing at 650°C for 30 minutes could effectively eliminate the as-grown TD, but couldn't affect the subsequent TD formation.
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