Micro-vibration Sensors Fabricated by Bulk Silicon Technology

霍明学,曲凤秋,王喜莲,刘晓为,陈强,陈伟平,张宏华
DOI: https://doi.org/10.3321/j.issn:0367-6234.2004.08.029
2004-01-01
Abstract:Micro-vibration sensors fabricated by bulk silicon process have the advantage of high sensitivity and low noise compared with the surface micromachining. The sensing element of the bulk machining vibration sensors is consisted of comb electrodes, and its elastic beams are novel multi-folding beams. The inductively coupled plasma technology (ICP) is used to produce the micro-vibration sensors, the maximal etching depth of which can be 400 μm, and the minimal width is less than 1 μm. The sensitivity of the sensor is 56.8 fF/g, the shock survival is over 1 000 g, and the resonant frequency is 2.5 kHz.
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