Abstract:Ion-beam assisted deposition method (IBAD) has become popular in the synthesis of many thin-film materials with distinguished properties. In comparison with plasma techniques, IBAD is a method which allows us to control more independently many essential deposition parameters (e.g. atom flux, ion energy, and ion incidence angle). Therefore, IBAD is a proper method for a fundamental study of the influence of these parameters on deposition processes and properties of their products[1-4]. In this study, amorphous carbon (a-C) films with a thickness of 100 nm were deposited on a single-crystal silicon (Si100) substrate by vacuum vapor deposition system using IBAD(Fig 1) with different Ar ion assisted bombardment energy (0eV; 150eV; 300eV; 450eV; 600eV; 750eV). The micro-structure (Table 1), micro-mechanical properties (Table 3), surface morphology (Fig 2), adhesion strengths (Fig 3) and friction behavior (Fig 4), of the a-C films were examined making use of atomic force microscopy (AFM), ball-on-disk reciprocating friction tester and nano-indentation system. The Raman spectra of the a-C films were recorded on a Jobin Yvon T64000 spectrometer operating with a 514.5 nm Ar laser as the excitation source (Table 1). The internal stress of the a-C films were calculated from the Stoney equation (Table 2). The results show that the anti-wear life and adhesion of the a-C films on the Si substrates were significantly increased by the assisting of low-energy-argon-ion beam and substrate temperature. The energy of the argon-ion beam and the value of internal stress play the key role in the increase of adhesion strength and the anti-wear life of the amorphous carbon film. The friction and wear mechanism of the amorphous carbon film under dry friction condition was also discussed.

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