EFFECTS OF SPUTTERING TECHNICAL PARAMETERS ON THE OPTICAL PROPERTIES OF Ag-In-Sb-Te PHASE-CHANGE FILMS

李进延,侯立松,干福熹
DOI: https://doi.org/10.3321/j.issn:1005-3093.2001.05.013
2001-01-01
Abstract:The phase-change films were deposited on K9 glass substrate by RF magnetron sputtering technique with an Ag-In-Sb-Te alloy target. The as-deposited films were annealed at 300 °C. The influences of background pressure, sputtering pressure and sputtering power on the optical properties of the phase-change films are studied. It was found that the optical properties of the phase-change films were synthetically determined by sputtering parameters and lower background pressure, while the proper sputtering pressure and sputtering power were very important for the AgInSbTe phase-change films.
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