Studies of Mg overlayer on GaAs(100) surface treated by CH3CSNH2
E.D. Lu,S.H. Xu,P.S. Xu,X.J. Yu,F.P. Zhang,H.B. Pan,X.Y. Zhang,T.X. Zhao,T.P. Zhao
DOI: https://doi.org/10.1016/0368-2048(96)02951-9
IF: 1.993
1996-01-01
Journal of Electron Spectroscopy and Related Phenomena
Abstract:A new sulfur passivation method for GaAs, CH3CSNH2 treatment, has been developed. By Synchrotron Radiation Photoemission Spectroscopy(SRPES), the chemical states and electronic aspects of the passivated surfaces are investigated. It is found that the oxide layer of the GaAs is effectively removed, and Sulfur atoms bond both to Ga and As atom at room temperature. In addition, the behavior of Mg deposited on the passivated surfaces with and without annealing has been investigated. It is found that Ga atoms can be exchanged from GaS bond, and diffuse into Mg overlayer, but the sulfur atoms remain at the interfaces. At higher Mg coverage, a MgGa alloy may be formed due to excess Mg atoms reacting with Ga atoms at the overlayer.